NDTnet 1998 Aug, Vol.3 No.8

Abstract

X-ray diffraction (XRD) is applied extensively as the major ex-situ method to characterize metallic and ceramic polycrystalline thin films. XRD is used to measure

preferred crystallographic orientation,
residual stress,
phase composition,
crystallinity, and
film thickness.

Conventional XRD instrumentation is, for the most part, not suitable for real-time in-situ, inprocess application. However, XRD has been applied under these conditions by developing unique instruments through interfacing electro-optics, fiber optics, and x-ray sources. The application of XRD to measuring phase composition, film thickness, and residual stress of chemical vapor deposition (CVD) films will be presented.

Results
The phase composition and thickness of layered metal/metal-oxide films and the thickness of diamond films have been nondestructively characterized, in-process, in-situ by a fiber optic based x-ray diffractometer [1]. The residual stress in metal films on polymers have been measured exsit~i with instrumentation suitable for in-situ measurement [2].

Conclusions
The results demonstrate the capability of fiber optic based XRD for real-time in-situ, in-process nondestructive characterization of thin films and the potential for application in process control

1. Kurtz, D.S., Ruud, C.O., and Fitting, J.O. Proc. Svmp. on NDE and Mat. ProP. II, TMS Warrendale, PA 1993, 192-197.
2. Yeager, M.D., Ruud, C.O., and Chen, P.C. J. of NDE, 1991, 10 No. 3, 79-87.

Abstract Source:
Book of Abstracts, 7th European Conference on Non-Destructive Testing, 26-29 May 1998, ISBN: 87-986898-0-00

Full-Text Source:
Proceedings of the 7th European Conference on Non-Destructive Testing, 26-29 May 1998, ISBN:

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