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|NDT.net Issue - 2012-07 - NEWS ||NDT.net Issue: 2012-07|
Publication: e-Journal of Nondestructive Testing (NDT) ISSN 1435-4934 (NDT.net Journal)
Hamamatsu Photonics High Resolution Microfocus X-ray SourceHamamatsu Photonics32, Hamamatsu-city, Japan
Hamamatsu Photonics are proud to introduce the 2010 Prism design award winning ultra high resolution micro-focus X-ray (MFX) source. This new source can provide sub-micron (so called nano-focus) resolution for the most demanding X-ray imaging applications.
The L10711-01 features dual cathode technology, with easily replaceable cathodes, giving the user the option of a high resolution (S Mode) LaB6 type, or a high intensity (W Mode) tungsten type cathode.
The L10711-01 is a fully integrated, open type microfocus X-ray unit, consisting of X-ray head, power supply, cooler and control electronics all contained within a single compact module. The unit can provide a minimum resolution just 0.25 µm (250 nm) whilst in S Mode, making it the highest resolution MFX source on the market today. A high intensity of 8W is available when in W Mode. The X-ray voltage is adjustable over the range from 20kV to 100kV in S Mode and 20kV to 160kV in W Mode.
This makes the L10711-01 suitable for the detection of very small cracks, defects, contaminants and artefacts in non-destructive testing applications. The L10711-01 is also suited to applications such as 3D imaging, and computed tomography (CT), which require a very high resolution and stable X-ray source.
As all Hamamatsu microfocus X-ray units are air cooled, they do not require oil emersion compared to conventional X-ray sources, making the new L10711-01 simple to integrate into an existing system.
For further information contact us on 01707 294 888 Email: firstname.lastname@example.org or visit our website: www.hamamatsu.co.uk